Program · ASD 2027 · Area Selective Deposition Workshop

Robert D. Clark

Director of TEL U.S. R&D Strategic Partnerships, Tokyo Electron US, USA

“Area selective deposition integration and applications”

Adriaan J.M. Mackus

Associate Professor, Plasma and Materials Processing, Applied Physics Department, Eindhoven University of Technology, Netherlands

“From Inhibition to Selectivity: Mechanistic Insights into Area-Selective ALD”

Christophe Vallée

Professor, College of Nanotechnology, Science, and Engineering, Department of Nanoscale Science & Engineering, University at Albany, USA

“Area selective deposition by Plasma-Enhanced Chemical Vapor Deposition”

Anjana Devi

Director of the Institute for Materials Chemistry, Leibniz Institute for Solid State and Materials Research Dresden, Germany

“Ligand Design and Reactivity Tuning: Tailoring Precursors for Area-Selective Deposition”

Ron Pearlstein

Executive Director, EMD Electronics, USA

“Precursor and inhibitor chemistry considerations for HVM”